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Browsing by Author "Bonzom, Renaud"

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    Epitaxial growth on germanium: kinetics and layer quality

    Bonzom, Renaud
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    Leys, Frederik
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    Loo, Roger  
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    Caymax, Matty  
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    Vandervorst, Wilfried  
    Oral presentation
    2005, 1st International Workshop on New Group IV, Semiconductor Nanoelectronics
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    Epitaxy solutions for Ge MOS technology

    Leys, Frederik
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    Bonzom, Renaud
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    Loo, Roger  
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    Richard, Olivier  
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    De Jaeger, Brice  
    Proceedings paper
    2005, 4th International Conference on Silicon Epitaxy and Heterostructures - ICSI-4, 23/05/2005
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    Ge deep sub-micron HiK/MG pFET with superior drive compared to Si HiK/MG state-of-the-art reference

    De Jaeger, Brice  
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    Kaczer, Ben  
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    Zimmerman, Paul
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    Opsomer, Karl  
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    Winderickx, Gillis  
    Journal article
    2007-01, Semiconductor Science and Technology, (22) 1, p.S221-S226
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    Germanium deep-submicron p-FET and n-FET devices, fabricated on germanium-on-insulator substrates

    Meuris, Marc  
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    De Jaeger, Brice  
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    Van Steenbergen, Jan  
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    Bonzom, Renaud
    ;
    Caymax, Matty  
    Book chapter
    2007
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    Growth kinetics and relaxation mechanism of very thin epitaxial Si films on (100) germanium

    Bonzom, Renaud
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    Leys, Frederik
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    Loo, Roger  
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    Richard, Olivier  
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    Vanhaeren, Danielle  
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    Rip, Jens  
    Oral presentation
    2005, MRS 2005 Spring Meeting Symposium P: In situ Studies of Gas/Solid Surface Reaction Dynamics
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    Growth kinetics of germanium on (100) germanium by pyrolysis of germane

    Bonzom, Renaud
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    Leys, Frederik
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    Loo, Roger  
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    Dessein, Kristof
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    Vandervorst, Wilfried  
    Oral presentation
    2005, MRS 2005 Spring Meeting Symposium P: In situ Studies of Gas/Solid Surface Reaction Dynamics
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    Optimisation of a thin epitaxial Si layer as Ge passivation layer to demonstrate deep sub-micron n- and p-FETs on Ge-On-Insulator substrates

    De Jaeger, Brice  
    ;
    Bonzom, Renaud
    ;
    Leys, Frederik
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    Richard, Olivier  
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    Van Steenbergen, Jan  
    Journal article
    2005-06, Microelectronic Engineering, 80, p.26-29
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    Study of CVD high-k gate oxides on high-mobility Ge and Ge/Si substrates

    Van Elshocht, Sven  
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    Caymax, Matty  
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    Conard, Thierry  
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    De Gendt, Stefan  
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    Hoflijk, Ilse  
    Proceedings paper
    2005, 4th International Conference on Silicon Epitaxy and Heterostructures - ICSI-4, 23/05/2005
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    Thin epitaxial Si film growth at low temperatures for germanium processing applications

    Bonzom, Renaud
    ;
    Leys, Frederik
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    Hellin, David  
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    Loo, Roger  
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    Caymax, Matty  
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    Vandervorst, Wilfried  
    Oral presentation
    2005, ASM International Epsilon User Meeting
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    TXRF layer analysis for advanced micro-electronic applications: a two case study, HfO2/Si and Si/Ge

    Hellin, David  
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    Rip, Jens  
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    Delabie, Annelies  
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    Bonzom, Renaud
    ;
    De Gendt, Stefan  
    ;
    Vinckier, Chris
    Meeting abstract
    2005, 11th International Conference on Total Reflection X-Ray Fluorescence Spectrometry and Related Methods - TXRF, 18/09/2005

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