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Study of CVD high-k gate oxides on high-mobility Ge and Ge/Si substrates
Publication:
Study of CVD high-k gate oxides on high-mobility Ge and Ge/Si substrates
Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Elshocht, Sven
;
Caymax, Matty
;
Conard, Thierry
;
De Gendt, Stefan
;
Hoflijk, Ilse
;
Houssa, Michel
;
Leys, Frederik
;
Bonzom, Renaud
;
De Jaeger, Brice
;
Van Steenbergen, Jan
;
Vandervorst, Wilfried
;
Heyns, Marc
;
Meuris, Marc
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1899
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1899
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations