Browsing by Author "Bovie, Inge"
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Publication 4X reticles with 3% linewidth control for the development of 0.18 µm lithography
Proceedings paper1996, 16th Annual Symposium on Photomask Technology and Management, 18/09/1996, p.290-301Publication Challenges with respect to high-k/metal gate stack etching and cleaning
Proceedings paper2007, Physics and Technology of High-k Dielectrics, 7/10/2007, p.275-283