Browsing by Author "Brand, A."
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Publication 15nm-WFIN high-performance low-defectivity strained-germanium pFinFETs with low temperature STI-last process
Proceedings paper2014, Symposium on VLSI Technology, 9/06/2014, p.138-139Publication Effective work function engineering for aggressively scaled planar and FinFET-based devices with high-k last replacement metal gate technology
; ; ; Proceedings paper2012-09, International Conference on Solid State Devices and Materials - SSDM, 25/09/2012Publication Effective work function engineering for aggressively scaled planar and multi-gate fin field-effect transistor-based devices with high-k last replacement metal gate technology
; ; ; Journal article2013, Japanese Journal of Applied Physics, (52) 4, p.04CA02