Publication:
Effective work function engineering for aggressively scaled planar and FinFET-based devices with high-k last replacement metal gate technology
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1959 since deposited on 2021-10-20
2last month
1last week
Acq. date: 2026-03-17
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Statistics
Views
1959 since deposited on 2021-10-20
2last month
1last week
Acq. date: 2026-03-17
Citations