Publication:
Effective work function engineering for aggressively scaled planar and FinFET-based devices with high-k last replacement metal gate technology
Date
Loading...
Journal
Abstract
Description
Metrics
Views
1954 since deposited on 2021-10-20
1last month
Acq. date: 2026-01-07
Citations
Metrics
Views
1954 since deposited on 2021-10-20
1last month
Acq. date: 2026-01-07
Citations