Browsing by Author "Bret, Tristan"
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Publication Additional evidence of EUV blank defects first seen by wafer printing
Proceedings paper2011, Photomask Technology 2011, 19/09/2011, p.81660EPublication Analysis of EUV mask multilayer defect printing characteristics
Proceedings paper2012, Extreme Ultraviolet (EUV) Lithography III, 12/02/2012, p.83220EPublication Comparison between existing inspection techniques for EUV mask defects
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 17/10/2010Publication Ebeam based mask repair as door opener for defect free EUV masks
Proceedings paper2012, Photomask Technology, 11/09/2012, p.85221MPublication EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force Microscopy
Publication Evidence of printing blank-related defects on EUV masks missed by blank inspection
Proceedings paper2011, 27th European Mask and Lithography Conference - EMLC, 18/01/2011, p.79850WPublication Mask defects in EUV lithography: Understanding
Oral presentation2012, China Semiconductor Technology International Conference at Semicon China - CSTICPublication Modeling strategies for EUV mask multilayer defect dispositioning
Proceedings paper2013, Extreme Ultraviolet (EUV) Lithography IV, 24/02/2013, p.86790YPublication Natural EUV mask blank defects: evidence, timely detection, analysis and outlook
Proceedings paper2010, Photomask Technology 2010, 13/09/2010, p.78231TPublication Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects
Proceedings paper2011, Physical Optics, 5/09/2011, p.81710MPublication Repair of natural EUV reticle defects
Proceedings paper2011, Photomask technology 2011, 19/09/2011, p.81661GPublication Rigorous modeling and optimization
Oral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication Study of multilayer defects on sub-32nm HP EUV reticles
Oral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication The door opener for EUV mask repair
Proceedings paper2012, Photomask and Next-Generation Lithography Mask Technology XIX, 17/04/2012, p.84410F