Browsing by Author "Capelli, Renzo"
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Publication EUV mask defect inspection for the 3nm technology node
Proceedings paper2023, 38th European Mask and Lithography Conference (EMLC 2023), 17/06/2023, p.Art. 128020HPublication Fundamental understanding and experimental verification of bright versus dark field imaging
;Davydova, Natalia ;Finders, Jo ;van Lare, Claire ;McNamara, John ;Van Setten, EelcoZekry, JosephProceedings paper2020, Extreme Ultraviolet Lithography 2020, 21/09/2020, p.115170PPublication Stochastic printing behavior of ML-defects on EUV mask
Proceedings paper2019-09, International Conference on Extreme Ultraviolet Lithography 2019, 16/09/2019, p.111470P