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Browsing by Author "Chabal, Y.J."

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    Gate oxide atomic layer deposition studied by in situ infrared spectroscopy

    Frank, M.M.
    ;
    Dörmann, S.
    ;
    Chabal, Y.J.
    ;
    Sayan, S.
    ;
    Garfunkel, E.
    ;
    Wilk, G.D.
    ;
    Green, M.L.
    Oral presentation
    2003, E-MRS Spring Meeting Symposium I Functional Metal Oxides - Semiconductor Structures
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    Initial growth kinetics of ALD Al2O3 and HfO2 and post-annealing effects

    Wilk, G.D.
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    Frank, M.
    ;
    Ho, M.Y.
    ;
    Green, Martin
    ;
    Chabal, Y.J.
    ;
    Raisanen, P.
    ;
    Brijs, Bert
    ;
    Sorsch, T.W.
    Oral presentation
    2002, Atomic Layer Deposition Conference - ALD

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