Browsing by Author "Chang, Vincent S."
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Publication DyScHfO as high-k gate dielectric: structural and electrical properties
Proceedings paper2007, Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS 3: New Materials, Processes and Equipment, 6/05/2007, p.113-120Publication The impact of stacked cap layers on effective work function with HfSiON and SiON gate dielectrics
Journal article2008-07, IEEE Electron Device Letters, (29) 7, p.743-745