Browsing by Author "Chen, Ying-Lin"
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Publication A High-Resolution EUV Zinc-Oximate Resist: Why Post-exposure Bake Fails to Improve Lithography Performance
Journal article2026, JOURNAL OF PHYSICAL CHEMISTRY C, (130) 19, p.6795-6807Publication e-beam Metrology for High-NA: Revisiting the imec Protocol
Proceedings paper2025, 2025 Conference on Metrology Inspection and Process Control-Annual, 2025-02-24, p.134260L-1-134260L-13Publication Fundamental understanding of exposure and process chemistry of Sn-based metal oxide resists: effects of ambient environment during post-exposure delay and bake
Journal article2026, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (25) 1, p.014601Publication Towards Improved Semiconductor Defect Inspection for high-NA EUVL based on SEMI-SuperYOLO-NAS
; ; ; ; ; Proceedings paper2024, Conference on Metrology, Inspection, and Process Control XXXVIII, FEB 26-29, 2024, p.129550W