Browsing by Author "Chin, A."
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Publication Wide Vfb and Vth tunability for metal-gated MOS devices with HfLaO gate dielectrics
Journal article2007-04, IEEE Electron Device Letters, (28) 4, p.258-260Publication Widely tunable work function TaN/Ru stacking layer on HfLaO gate dielectric
Publication Work function tunability of refractory metal nitrides by lanthanum or aluminum doping for advanced CMOS devices