Publication:

Widely tunable work function TaN/Ru stacking layer on HfLaO gate dielectric

Date

2008
Journal article
Simple item page Full metadata Statistics
Loading...
Thumbnail Image

Files

18484.pdf 212.18 KB

Author(s)

Wang, X.P.
;
Li, M.F.
;
Yu, HongYu
;
Yang, J.J.
;
Chen, J.D.
;
Zhu, C.X.
;
Du, A.Y.
;
Loh, W.Y.
;
Biesemans, Serge  
;
Chin, A.
;
Lo, G.Q.
;
Kwong, D.L.

Journal

IEEE Electron Device Letters

Abstract

Description

Statistics

Views

1955 since deposited on 2021-10-17
Acq. date: 2026-02-24

Citations

Statistics

Views

1955 since deposited on 2021-10-17
Acq. date: 2026-02-24

Citations