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Widely tunable work function TaN/Ru stacking layer on HfLaO gate dielectric
Publication:
Widely tunable work function TaN/Ru stacking layer on HfLaO gate dielectric
Date
2008
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wang, X.P.
;
Li, M.F.
;
Yu, HongYu
;
Yang, J.J.
;
Chen, J.D.
;
Zhu, C.X.
;
Du, A.Y.
;
Loh, W.Y.
;
Biesemans, Serge
;
Chin, A.
;
Lo, G.Q.
;
Kwong, D.L.
Journal
IEEE Electron Device Letters
Abstract
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1952
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1952
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations