Browsing by Author "Clark, Benjamin L."
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Publication Demonstration of an N7 integrated fab process for metal oxide EUV photoresist
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography VII, 21/02/2016, p.97760BPublication Integrated fab process for metal oxide EUV photoresist
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.94250SPublication Optimization of Point-Of-Use Filtration for Metal Oxide Photoresist
Proceedings paper2021, Conference on Advances in Patterning Materials and Processes XXXVIII Part of SPIE Advanced Lithography Conference, FEB 22-26, 2021, p.116120X