Browsing by Author "Colina, Alberto"
Now showing 1 - 4 of 4
- Results Per Page
- Sort Options
Publication Image placement error: closing the gap between overlay and imaging
Journal article2005, Journal Microlith., Microfab., Microsyst., (JM3), (4) 3, p.33006Publication LCDU decomposition and scaling: mask and resist effects on local MEEF and stochastics
Proceedings paper2024, 2024 International Conference on Extreme Ultraviolet Lithography, SEP 30-OCT 03, 2024, p.Art. 132150QPublication Logic via printability enhancement using restricted via placement and exhaustive SRAF placement on a staggered grid
Proceedings paper2022-05-26, Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference, APR 24-MAY 27, 2022, p.120510IPublication Pattern displacement induced by lens aberrations
Proceedings paper2002, 22nd Annual Bacus Symposium on Photomask Technology, 1/10/2002, p.1155-1162