Publication:

Logic via printability enhancement using restricted via placement and exhaustive SRAF placement on a staggered grid

Date

2022-05-26
Proceedings Paper
https://doi.org/10.1117/12.2614260
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spie2022_stag_via_paper_9.pdf 1.04 MB

Author(s)

Woltgens, Pieter
;
Colina, Alberto
;
Rio, David
;
Delorme, Max  
;
Kovalevich, Tatiana  
;
Thiam, Arame  
;
Van Roey, Frieda  
;
Zografos, Odysseas  

Journal

SPIE Proceedings Vol. 12051: Optical and EUV Nanolithography XXXV

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373 since deposited on 2022-09-19
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1463 since deposited on 2022-09-19
Acq. date: 2026-04-27

Citations