Browsing by Author "Creusen, Martin"
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Publication Analysing antenna ratio dependence of plasma charging damage with Weibull breakdown statistics
Proceedings paper2000, Proceedings of the 30th European Solid-State Device Research Conference - ESSDERC, 11/09/2000, p.528-531Publication Anomalously weak antenna ratio dependence of plasma process-induced damage
Proceedings paper2000, Proceedings of the 5th International Symposium on Plasma Process-Induced Damage - P2ID, 23/05/2000, p.6-9Publication Antenna test structure matrix description, application for optimized HDP oxide deposition, metal etch, Ar preclean and passivation processing in sub-half micron CMOS processing
;Ackaert, J. ;de Backer, E. ;Coppens, P.Creusen, MartinOral presentation1999, 1st European Symposium on Plasma Process Induced Damage (ESPID'1); 25-26 November 1999; Toulouse, France.Publication Impact of plasma density and pattern aspect ratio on plasma damage in deep submicron CMOS technologies
Proceedings paper1999, ESSDERC'99 - Proceedings of the 29th European Solid-State Device Research Conference; 13-15 September 1999; Leuven, Belgium., p.164-167Publication Impact of reactor- and transistor-type on electron shading
Proceedings paper1999, Proceedings 1999 International Symposium on Plasma Process-Induced Damage - P2ID, 09/05/1999, p.8-11Publication Quantitative yield and reliability projection from antenna test results - A case study
Proceedings paper2000, Symposium on VLSI Technology. Digest of Technical Papers, 13/06/2000, p.96-97Publication Reduction of plasma process induced damage during gate poly etching by using the SiO2 hard maks
Proceedings paper1998, Proceedings of the 3rd International Symposium on Plasma-Induced Damage - P2ID, 4/06/1998, p.72-75Publication The effect of plasma damage and different annealing ambients on the generation of latent interface states
Proceedings paper1998, Proceedings of the 3rd International Symposium on Plasma-Induced Damage - P2ID, 4/06/1998, p.217-220