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Browsing by Author "Creusen, Martin"

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    Analysing antenna ratio dependence of plasma charging damage with Weibull breakdown statistics

    Van den Bosch, Geert  
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    Creusen, Martin
    ;
    Degraeve, Robin  
    ;
    Kaczer, Ben  
    ;
    Groeseneken, Guido  
    Proceedings paper
    2000, Proceedings of the 30th European Solid-State Device Research Conference - ESSDERC, 11/09/2000, p.528-531
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    Anomalously weak antenna ratio dependence of plasma process-induced damage

    Van den Bosch, Geert  
    ;
    Creusen, Martin
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    Degraeve, Robin  
    ;
    Kaczer, Ben  
    ;
    Groeseneken, Guido  
    Proceedings paper
    2000, Proceedings of the 5th International Symposium on Plasma Process-Induced Damage - P2ID, 23/05/2000, p.6-9
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    Antenna test structure matrix description, application for optimized HDP oxide deposition, metal etch, Ar preclean and passivation processing in sub-half micron CMOS processing

    Ackaert, J.
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    de Backer, E.
    ;
    Coppens, P.
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    Creusen, Martin
    Oral presentation
    1999, 1st European Symposium on Plasma Process Induced Damage (ESPID'1); 25-26 November 1999; Toulouse, France.
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    Impact of plasma density and pattern aspect ratio on plasma damage in deep submicron CMOS technologies

    Creusen, Martin
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    Van den bosch, G.
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    van der Groen, Sonja
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    Groeseneken, Guido  
    ;
    Ackaert, J.
    Proceedings paper
    1999, ESSDERC'99 - Proceedings of the 29th European Solid-State Device Research Conference; 13-15 September 1999; Leuven, Belgium., p.164-167
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    Impact of reactor- and transistor-type on electron shading

    Creusen, Martin
    ;
    Ackaert, J.
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    De Backer, E.
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    Groeseneken, Guido  
    Proceedings paper
    1999, Proceedings 1999 International Symposium on Plasma Process-Induced Damage - P2ID, 09/05/1999, p.8-11
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    Quantitative yield and reliability projection from antenna test results - A case study

    Mason, P. W.
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    Cheung, K. P.
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    Hwang, D. K.
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    Creusen, Martin
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    Degraeve, Robin  
    ;
    Kaczer, Ben  
    Proceedings paper
    2000, Symposium on VLSI Technology. Digest of Technical Papers, 13/06/2000, p.96-97
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    Reduction of plasma process induced damage during gate poly etching by using the SiO2 hard maks

    Lee, Hean-Cheal
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    Creusen, Martin
    ;
    Groeseneken, Guido  
    ;
    Vanhaelemeersch, Serge  
    Proceedings paper
    1998, Proceedings of the 3rd International Symposium on Plasma-Induced Damage - P2ID, 4/06/1998, p.72-75
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    The effect of plasma damage and different annealing ambients on the generation of latent interface states

    Creusen, Martin
    ;
    Lee, Hean-Cheal
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    Vanhaelemeersch, Serge  
    ;
    Groeseneken, Guido  
    Proceedings paper
    1998, Proceedings of the 3rd International Symposium on Plasma-Induced Damage - P2ID, 4/06/1998, p.217-220

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