Browsing by Author "Curley, J. W."
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Publication Evaluation of stress reduction in shallow trench isolation CMOS structures via synchrotron X-ray topography, Raman spectroscopy and electrical data
Oral presentation1998, 2nd International Conference on Materials for Microelectronics; 14-15 Sept. 1998; Bordeaux, France.Publication Monitoring of stress reduction in shallow trench isolation CMOS structures via synchrotron x-ray topography, electrical data and Raman spectroscopy
;McNally, P. J. ;Curley, J. W. ;Bolt, M. ;Reader, A. ;Tuomi, T. ;Rantamaki, R.Danilewsky, A. N.Journal article1999, J. Materials Science: Materials in Electronics, (10) 5_6, p.351-358