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Browsing by Author "Curley, J. W."

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    Evaluation of stress reduction in shallow trench isolation CMOS structures via synchrotron X-ray topography, Raman spectroscopy and electrical data

    McNally, P. J.
    ;
    Curley, J. W.
    ;
    Bolt, M.
    ;
    Reader, A.
    ;
    De Wolf, Ingrid  
    ;
    Tuomi, T.
    ;
    Rantamäki, R.
    Oral presentation
    1998, 2nd International Conference on Materials for Microelectronics; 14-15 Sept. 1998; Bordeaux, France.
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    Monitoring of stress reduction in shallow trench isolation CMOS structures via synchrotron x-ray topography, electrical data and Raman spectroscopy

    McNally, P. J.
    ;
    Curley, J. W.
    ;
    Bolt, M.
    ;
    Reader, A.
    ;
    Tuomi, T.
    ;
    Rantamaki, R.
    ;
    Danilewsky, A. N.
    Journal article
    1999, J. Materials Science: Materials in Electronics, (10) 5_6, p.351-358

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