Browsing by Author "Daté, L."
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Publication Growth and physical properties of MOCVD-deposited hafnium oxide films and their properties on silicon
Proceedings paper2003, Novel Materials and Processes for Advanced CMOS, 2/12/2002, p.197-202Publication High-k materials for advanced gate stack dielectrics: a comparison of ALCVD and MOCVD as deposition technologies
Proceedings paper2003, CMOS Front-End Materials and Process Technology, 21/04/2003, p.47-58