Publication:

High-k materials for advanced gate stack dielectrics: a comparison of ALCVD and MOCVD as deposition technologies

Date

2003

Proceedings Paper

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Author(s)

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Conard, Thierry

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De Gendt, Stefan

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Delabie, Annelies

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Ragnarsson, Lars-Ake

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Richard, Olivier

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Vandervorst, Wilfried

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Van Elshocht, Sven

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Metrics

2070 since deposited on 2021-10-15

Acq. date: 2025-12-10