Browsing by Author "David, M.L."
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Publication Co-germanide Schottky contacts on Ge
Proceedings paper2008, Gettering and Defect Engineering in Semiconductor Technology XII, 14/10/2007, p.107-111Publication Comparison of defects created by plasma-based ion implantation and conventional implantation of hydrogen in germanium
Proceedings paper2008, Gettering and Defect Engineering in Semiconductor Technology XII, 14/10/2007, p.101-106Publication Defects created by plasma immersion ion implantation of hydrogen in germanium
Oral presentation2007, MRS Spring Meeting Symposium F: Semiconductor Defect Engineering - Materials, Synthesis, Structures and Devices IIPublication Electrically active defects in irradiated n-Type Czochralski silicon doped with group IV impurities
Oral presentation2004, Workshop on Defects Relevant to Engineering Advanced Silicon-Based DevicesPublication Extended defects created by helium implantation at different temperature in germanium
Oral presentation2008, International Conference on Extended Defects in Semiconductors - EDSPublication Extended defects created by hydrogen implantation in germanium: the influence of the substrate temperature
Oral presentation2008, International Conference on Extended Defects in Semiconductors - EDSPublication Extended defects created by light ion implantation in Germanium
;David, M.L. ;Barbot, J.F. ;Rousselet, S. ;Pailloux, F. ;Babonneau, D.Beaufort, M.F.Proceedings paper2008, High Purity Silicon 10, 12/10/2008, p.163-175Publication Influence of pre-treatment on Co-germanide Schottky contacts
Journal article2008, Materials Science in Semiconductor Processing, (11) 5_6, p.300-304Publication On the effect of lead on irradiation induced defects in silicon
Proceedings paper2005, Gettering and Defect Engineering in Semiconductor Technology XI. Proceedings of the 11th International Autumn Meeting, 25/09/2005, p.373-378Publication Shallow boron implantations in Ge and the role of the pre-amorphization depth
Journal article2008, Materials Science in Semiconductor Processing, (11) 5_6, p.368-371Publication The effect of the substrate temperature on extended defects created by hydrogen implantation in germanium
Journal article2007, Journal of Applied Physics, (102) 9, p.96101