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Browsing by Author "De Clercq, Astrid"

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    In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPS

    Rodriguez, Leonard
    ;
    De Clercq, Astrid
    ;
    Tallarida, Massimo
    ;
    Cuypers, Daniel
    Meeting abstract
    2012, AVS 59th International Symposium & Exhibition, 29/10/2012
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    In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPS

    Rodriguez, Leonard
    ;
    De Clercq, Astrid
    ;
    Tallarida, Massimo
    ;
    Cuypers, Daniel
    Oral presentation
    2012, AVS 59th International Symposium & Exhibition
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    In-situ studies of the chemistry of trimethyl-aluminum on III-V semiconductor surfaces

    Adelmann, Christoph  
    ;
    Tallarida, Massimo
    ;
    Cuypers, Daniel
    ;
    Rodriguez, Leonard
    Meeting abstract
    2012, 39th Conference on the Physics and Chemistry of Surfaces and Interfaces - PCSI, 22/01/2012
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    Interface chemistry of Al2O3/III-V upon atomic layer deposition

    Tallarida, Massimo
    ;
    Adelmann, Christoph  
    ;
    Cuypers, Daniel
    ;
    Rodriguez, Leonard
    ;
    Lin, Dennis  
    Oral presentation
    2012, E-MRS Spring Meeting Symposium M: More than Moore
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    Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide

    Adelmann, Christoph  
    ;
    Cuypers, Daniel
    ;
    Tallarida, Massimo
    ;
    Rodriguez, Leonard
    Journal article
    2013, Chemistry of Materials, (25) 7, p.1078-1091

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