Browsing by Author "Demand, M."
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Publication Dry Etch Challenges for Patterning Middle-of-line (MOL) Contact Trench in Monolithic CFET (complementary FET)
Proceedings paper2024, Conference on Advanced Etch Technology and Process Integration for Nanopatterning XIII, 2024-02-25, p.129590BPublication Moore's Law meets High-NA EUV: Random via patterning for next-generation nodes