Publication:

Dry Etch Challenges for Patterning Middle-of-line (MOL) Contact Trench in Monolithic CFET (complementary FET)

Date

2024

Proceedings Paper

https://doi.org/10.1117/12.3014213

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Author(s)

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Vega Gonzalez, Victor

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Montero Alvarez, Daniel

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Lazzarino, Frederic

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Horiguchi, Naoto

Journal

Proceedings of SPIE

Statistics

503 since deposited on 2024-06-06

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Acq. date: 2026-01-26