Repository logo Institutional repository
  • Communities & Collections
  • Scientific publicationsOpen knowledge
Search repository
High contrast
  1. Home
  2. Dry Etch Challenges for Patterning Middle-of-line (MOL) Contact Trench in Monolithic CFET (complementary FET)
  3. Statistics

Statistics by Category

Reports

  • Most viewed
  • Most viewed per month
  • Top city views
  • File Visits
Item Views
Dry Etch Challenges for Patterning Middle-of-line (MOL) Contact Trench in Monolithic CFET (complementary FET) 500

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings