Publication:
Dry Etch Challenges for Patterning Middle-of-line (MOL) Contact Trench in Monolithic CFET (complementary FET)
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| dc.contributor.author | Sarkar, T. | |
| dc.contributor.author | Radisic, Dunja | |
| dc.contributor.author | Vega Gonzalez, Victor | |
| dc.contributor.author | Stiers, Karen | |
| dc.contributor.author | Sheng, C. | |
| dc.contributor.author | Montero Alvarez, Daniel | |
| dc.contributor.author | Jenkins, H. | |
| dc.contributor.author | Demand, M. | |
| dc.contributor.author | Wang, P. | |
| dc.contributor.author | Lazzarino, Frederic | |
| dc.contributor.author | Horiguchi, Naoto | |
| dc.contributor.imecauthor | Sarkar, T. | |
| dc.contributor.imecauthor | Radisic, D. | |
| dc.contributor.imecauthor | Gonzalez, V. Vega | |
| dc.contributor.imecauthor | Stiers, K. | |
| dc.contributor.imecauthor | Sheng, C. | |
| dc.contributor.imecauthor | Montero, D. | |
| dc.contributor.imecauthor | Lazzarino, F. | |
| dc.contributor.imecauthor | Horiguchi, N. | |
| dc.date.accessioned | 2024-06-06T18:30:28Z | |
| dc.date.available | 2024-06-06T18:30:28Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1117/12.3014213 | |
| dc.identifier.eisbn | 978-1-5106-7223-9 | |
| dc.identifier.isbn | 978-1-5106-7222-2 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43997 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 129590B | |
| dc.source.conference | Conference on Advanced Etch Technology and Process Integration for Nanopatterning XIII | |
| dc.source.conferencedate | 2024-02-25 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 9 | |
| dc.title | Dry Etch Challenges for Patterning Middle-of-line (MOL) Contact Trench in Monolithic CFET (complementary FET) | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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