Publication:

Dry Etch Challenges for Patterning Middle-of-line (MOL) Contact Trench in Monolithic CFET (complementary FET)

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3014213
Simple item page Full metadata Statistics
 
dc.contributor.authorSarkar, T.
dc.contributor.authorRadisic, Dunja
dc.contributor.authorVega Gonzalez, Victor
dc.contributor.authorStiers, Karen
dc.contributor.authorSheng, C.
dc.contributor.authorMontero Alvarez, Daniel
dc.contributor.authorJenkins, H.
dc.contributor.authorDemand, M.
dc.contributor.authorWang, P.
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorSarkar, T.
dc.contributor.imecauthorRadisic, D.
dc.contributor.imecauthorGonzalez, V. Vega
dc.contributor.imecauthorStiers, K.
dc.contributor.imecauthorSheng, C.
dc.contributor.imecauthorMontero, D.
dc.contributor.imecauthorLazzarino, F.
dc.contributor.imecauthorHoriguchi, N.
dc.date.accessioned2024-06-06T18:30:28Z
dc.date.available2024-06-06T18:30:28Z
dc.date.issued2024
dc.identifier.doi10.1117/12.3014213
dc.identifier.eisbn978-1-5106-7223-9
dc.identifier.isbn978-1-5106-7222-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43997
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage129590B
dc.source.conferenceConference on Advanced Etch Technology and Process Integration for Nanopatterning XIII
dc.source.conferencedate2024-02-25
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages9
dc.title

Dry Etch Challenges for Patterning Middle-of-line (MOL) Contact Trench in Monolithic CFET (complementary FET)

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions