Browsing by Author "Demmerle, Wolfgang"
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Publication Application of an inverse Mack model for negative tone development simulation
Publication Efficient mask characterization through automated contour and corner rounding extraction
Proceedings paper2023, 38th European Mask and Lithography Conference - EMLC, 2023-06-19, p.128020JPublication Experimental validation of rigorous, 3D profile models for negative-tone develop resists
Publication Experimental validation of stochastic modeling for negative-tone develop EUV resist
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.942223Publication High-NA EUV Optical Proximity Correction Modeling Flow: from Data Preparation to Model Validation
Publication Patterning process exploration of metal 1 layer in 7nm node with 3D pattering flow simulations
Proceedings paper2015, Optical Microlithographies XXVIII, 22/02/2015, p.942609Publication Prediction of EUV stochastic microbridge probabilities by lithography simulations
Proceedings paper2020, Extreme Ultraviolet (EUV) Lithography XI, 23/02/2020, p.113230K