Browsing by Author "Demmerle, Wolfgang"
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Publication Application of an inverse Mack model for negative tone development simulation
Publication Experimental validation of rigorous, 3D profile models for negative-tone develop resists
Publication Experimental validation of stochastic modeling for negative-tone develop EUV resist
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.942223Publication Patterning process exploration of metal 1 layer in 7nm node with 3D pattering flow simulations
Proceedings paper2015, Optical Microlithographies XXVIII, 22/02/2015, p.942609Publication Prediction of EUV stochastic microbridge probabilities by lithography simulations
Proceedings paper2020, Extreme Ultraviolet (EUV) Lithography XI, 23/02/2020, p.113230K