Browsing by Author "Dinh, Cong Que"

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Calibrated PSCAR stochastic simulation

Dinh, Cong Que
;
Nagahara, Seji
;
Shiraishi, Gousuke
;
Minekawa, Yukie
;
Kamei, Yuya
Proceedings paper
2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109571O
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing

Dinh, Cong Que
;
Nagahara, Seiji
;
Kuwahara, Yuhei
;
Dauendorffer, Arnaud
;
Yoshida, Keisuke
Journal article
2022, JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, (35) 1, p.87-93
Recent advances in EUV patterning in preparation towards high-NA EUV

Nagahara, Seiji
;
Dauendorffer, Arnaud
;
Thiam, Arame
;
Liu, Xiang
;
Kuwahara, Yuhei
;
Dinh, Cong Que
Proceedings paper
2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124981G