Publication:

EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing

Date

2022
Journal article
https://doi.org/10.2494/photopolymer.35.87
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Author(s)

Dinh, Cong Que
;
Nagahara, Seiji
;
Kuwahara, Yuhei
;
Dauendorffer, Arnaud
;
Yoshida, Keisuke
;
Okada, Soichiro
;
Onitsuka, Tomoya
;
Kawakami, Shinichiro
;
Shimura, Satoru
;
Muramatsu, Makoto
;
Yoshihara, Kosuke
;
Petersen, John  
;
De Simone, Danilo  
;
Foubert, Philippe  
;
Vandenberghe, Geert  
;
Huli, Lior
;
Grzeskowiak, Steven
;
Krawicz, Alexandra
;
Bae, Nayoung
;
Kato, Kanzo
;
Nafus, Kathleen
;
Raley, Angelique

Journal

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

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1404 since deposited on 2023-04-30
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Acq. date: 2026-07-16

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