Publication:
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-4815-3770 | |
| cris.virtual.orcid | 0009-0001-2424-1322 | |
| cris.virtual.orcid | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-3927-5207 | |
| cris.virtualsource.department | 0cad242e-b04f-43bb-be0d-cfcf7a41da8f | |
| cris.virtualsource.department | b4f8c238-ae6a-4a36-b09f-6a93bec3afa5 | |
| cris.virtualsource.department | 6d3c12ff-d1ca-4ea8-bb8d-a09f3b7736ee | |
| cris.virtualsource.department | ffad9b55-9af5-4edb-8c86-134820dc8dd9 | |
| cris.virtualsource.orcid | 0cad242e-b04f-43bb-be0d-cfcf7a41da8f | |
| cris.virtualsource.orcid | b4f8c238-ae6a-4a36-b09f-6a93bec3afa5 | |
| cris.virtualsource.orcid | 6d3c12ff-d1ca-4ea8-bb8d-a09f3b7736ee | |
| cris.virtualsource.orcid | ffad9b55-9af5-4edb-8c86-134820dc8dd9 | |
| dc.contributor.author | Dinh, Cong Que | |
| dc.contributor.author | Nagahara, Seiji | |
| dc.contributor.author | Kuwahara, Yuhei | |
| dc.contributor.author | Dauendorffer, Arnaud | |
| dc.contributor.author | Yoshida, Keisuke | |
| dc.contributor.author | Okada, Soichiro | |
| dc.contributor.author | Onitsuka, Tomoya | |
| dc.contributor.author | Kawakami, Shinichiro | |
| dc.contributor.author | Shimura, Satoru | |
| dc.contributor.author | Muramatsu, Makoto | |
| dc.contributor.author | Yoshihara, Kosuke | |
| dc.contributor.author | Petersen, John | |
| dc.contributor.author | De Simone, Danilo | |
| dc.contributor.author | Foubert, Philippe | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.author | Huli, Lior | |
| dc.contributor.author | Grzeskowiak, Steven | |
| dc.contributor.author | Krawicz, Alexandra | |
| dc.contributor.author | Bae, Nayoung | |
| dc.contributor.author | Kato, Kanzo | |
| dc.contributor.imecauthor | Petersen, John | |
| dc.contributor.imecauthor | De Simone, Danilo | |
| dc.contributor.imecauthor | Foubert, Philippe | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
| dc.date.accessioned | 2023-05-25T12:36:56Z | |
| dc.date.available | 2023-04-30T04:07:33Z | |
| dc.date.available | 2023-05-25T12:36:56Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2022 | |
| dc.identifier.doi | 10.2494/photopolymer.35.87 | |
| dc.identifier.issn | 0914-9244 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41520 | |
| dc.publisher | TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN | |
| dc.source.beginpage | 87 | |
| dc.source.endpage | 93 | |
| dc.source.issue | 1 | |
| dc.source.journal | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | |
| dc.source.numberofpages | 7 | |
| dc.source.volume | 35 | |
| dc.title | EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: | ||