Browsing by Author "Dos Santos Filho, Sebastio G."
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Publication Physical characterization of hafnium aluminates dielectrics deposited by atomic layer deposition
Journal article2015-09, Journal of Integrated Circuits and Systems, (10) 1, p.49-58Publication Physical characterization of high-k HfxAl1-xOy gate dielectrics prepared by ALD
Proceedings paper2011, 26th Symposium on Microelectronics Technology and Devices - SBMicro, 30/08/2011, p.393-400