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Physical characterization of hafnium aluminates dielectrics deposited by atomic layer deposition
Publication:
Physical characterization of hafnium aluminates dielectrics deposited by atomic layer deposition
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Date
2015-09
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Huanca, Danilo R.
;
Christiano, V.
;
Adelmann, Christoph
;
Verdonck, Patrick
;
Dos Santos Filho, Sebastio G.
Journal
Journal of Integrated Circuits and Systems
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1835
since deposited on 2021-10-22
Acq. date: 2026-01-09
Citations
Metrics
Views
1835
since deposited on 2021-10-22
Acq. date: 2026-01-09
Citations