Physical characterization of hafnium aluminates dielectrics deposited by atomic layer deposition

dc.contributor.author	Huanca, Danilo R.
dc.contributor.author	Christiano, V.
dc.contributor.author	Adelmann, Christoph
dc.contributor.author	Verdonck, Patrick
dc.contributor.author	Dos Santos Filho, Sebastio G.
dc.contributor.imecauthor	Adelmann, Christoph
dc.contributor.imecauthor	Verdonck, Patrick
dc.contributor.orcidimec	Adelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimec	Verdonck, Patrick::0000-0003-2454-0602
dc.date.accessioned	2021-10-22T19:46:49Z
dc.date.available	2021-10-22T19:46:49Z
dc.date.issued	2015-09
dc.identifier.issn	1807-1953
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/25401
dc.identifier.url	http://www.sbmicro.org.br/jics/
dc.source.beginpage	49
dc.source.endpage	58
dc.source.issue	1
dc.source.journal	Journal of Integrated Circuits and Systems
dc.source.volume	10
dc.title	Physical characterization of hafnium aluminates dielectrics deposited by atomic layer deposition
dc.type	Journal article
dspace.entity.type	Publication
Files
Publication available in collections:	Articles