Browsing by Author "Drapeau, Martin"
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Publication A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond
Proceedings paper2005, 25th Annual BACUS Symposium on Photomask Technology, 3/10/2005, p.59921TPublication Double patterning design split implementation and validation for the 32nm node
Proceedings paper2007, Design for Manufacturability through Design-Process Integration, 28/02/2007, p.652109