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Conference contributions
Double patterning design split implementation and validation for the 32nm node
Publication:
Double patterning design split implementation and validation for the 32nm node
Date
2007
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Drapeau, Martin
;
Wiaux, Vincent
;
Hendrickx, Eric
;
Verhaegen, Staf
;
Machida, Takahiro
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Abstract
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1916
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
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Views
1916
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations