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Browsing by Author "Dusa, M."

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    CD control using SiON BARL processing for sub 0.25µm lithography

    Zhang, Fenghong
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    Op de Beeck, Maaike  
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    Ronse, Kurt  
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    Gangala, Hareen K
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    Gopalan, P.
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    Conley, P.
    Oral presentation
    1998, MNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium.
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    CD control using SiON BARL processing for sub-0.25μm lithography

    Zhang, Fenghong
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    Op de Beeck, Maaike  
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    Schaekers, Marc  
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    Ronse, Kurt  
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    Conley, W.
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    Gopalan, P.
    Journal article
    1999, Microelectronic Engineering, (46) 1_4, p.51-54
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    CD-control comparison for sub-0.18μm patterning using 248 nm lithography and strong resolution enhancement techniques

    Vandenberghe, Geert  
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    Marschner, Thomas
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    Ronse, Kurt  
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    Socha, R.
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    Dusa, M.
    Proceedings paper
    1999, Optical Microlithography XII, 14/03/1999, p.228-238
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    KrF lithography for 130nm

    Finders, Jo
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    van Schoot, J.
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    Vanoppen, Peter
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    Dusa, M.
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    Socha, B.
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    Vandenberghe, Geert  
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    Ronse, Kurt  
    Proceedings paper
    2000, Optical Microlithography XIII, 1/03/2000, p.192-205
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    Optimisation methodology towards a manufacturable 0.3 μm poly-gate process using i-line lithography

    Finders, Jo
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    Bruggeman, B.
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    Ronse, Kurt  
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    Van den hove, Luc  
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    Tzviatkov, Plamen
    ;
    Dusa, M.
    Proceedings paper
    1996, Proceedings of the Microlithography Seminar INTERFACE, 27/10/1996, p.223-246

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