Browsing by Author "Dussarat, C."
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Publication Adsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian)
Journal article2015, Electronic Engineering, 3, p.49Publication Low-k cryo-etching : comparison of four different High Boiling Point Organic (HBPO)
;Chanson, Romain ;Lefaucheux, P.L. ;Dussart, R. ;Tillocher, T. ;Shen, P. ;Urabe, K.Dussarat, C.Meeting abstract2017, AVS 64th International Symposium & Exhibition, 28/10/2017, p.EM-ThP5