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Browsing by Author "Dussarat, C."

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    Adsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian)

    Rezvanov, A.
    ;
    Gutshin, O.
    ;
    Gornev, E.
    ;
    Krasnikov, G.
    ;
    Mogil'nikov, K.
    ;
    Zhang, Liping  
    Journal article
    2015, Electronic Engineering, 3, p.49
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    Low-k cryo-etching : comparison of four different High Boiling Point Organic (HBPO)

    Chanson, Romain
    ;
    Lefaucheux, P.L.
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    Dussart, R.
    ;
    Tillocher, T.
    ;
    Shen, P.
    ;
    Urabe, K.
    ;
    Dussarat, C.
    Meeting abstract
    2017, AVS 64th International Symposium & Exhibition, 28/10/2017, p.EM-ThP5

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