Browsing by Author "Eitoku, A."
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Publication Aging phenomena in the removal of nano-particles from Si wafers
; ; Proceedings paper2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.151-154Publication Challenges of single-wafer wet cleaning for low temperature pre-epitaxial treatment of SiGe
Proceedings paper2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.243-246Publication Effect of chemical growth air filter for wafer storage before epitaxial growth
Proceedings paper2008, SEMATECH Meeting, 31/03/2008Publication New wet process strategies for reduced La2O3 and MgO2 high-k cap-dielectric loss
Proceedings paper2009, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11, 5/10/2009, p.45-51Publication Particle removal from micrometer-sized trenches using high-velocity-aerosol cleaning and comparison with megasonic tank cleaning
Proceedings paper2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.55-60Publication Removal of nano-particles by mixed-fluid jet: evaluation of cleaning performance and comparison with megasonic
Proceedings paper2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.193-196Publication Single-wafer wet chemical oxide formation for pre-ALD high-k deposition on 300 mm wafer
Proceedings paper2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.53-56