Browsing by Author "Elers, K."
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Publication Properties of TiN thin films deposited by ALCVD as barriers for Cu metallization
Oral presentation2000, MRS Spring Meeting 2000. Symposium D: Materials, Technology, and Reliability for Advanced Interconnects and Low-k DielectricsPublication Properties of TiN thin films deposited by ALCVD as barriers for Cu metallization
Proceedings paper2001, Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics, 23/04/2000, p.D6.5.1-D6.5.6