Browsing by Author "Eliat, Astrid"
Now showing 1 - 7 of 7
- Results Per Page
- Sort Options
Publication Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum-UV cleaning
Proceedings paper2004, Optical Microlithography XVII, 22/02/2004, p.487-503Publication Front-end-of-line process development using 193-nm lithography
Proceedings paper2001, Lithography for Semiconductor Manufacturing II, 30/05/2001, p.56-68Publication SiON ARC: Material characterization and implication in lithographic process
Proceedings paper2000, Proceedings Interface - Arch Microlithography Symposium, 5/11/2000, p.191-200Publication Status 157nm lithography development at IMEC
Proceedings paper2003, Optical Microlithography XVI, 23/02/2003, p.640-649Publication Status of 157nm Lithography Development
Oral presentation2003, Semicon Europa - Advanced Imaging SeminarPublication Status of UV2 Litho project : Usable Vacuum Ultra Violet Lithography
Meeting abstract2003-08, 4th International Symposium on 157nm Lithography, 25/08/2003Publication UV2Litho: usable vacuum ultra violet lithography
Oral presentation2002, 3th International Symposium on 157nm Lithography