Browsing by Author "Felch, S.B."
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Publication Advanced front-end processes for the 45nm CMOS technology node
Oral presentation2004, E-MRS Spring Meeting Symposium B: Materials Science Issues in Advanced CMOS Source-Drain EngineeringPublication Co-implantation with conventional spike anneal solutions for 45 nm ultra-shallow junction formation
Proceedings paper2005, USJ - The 8th Int. Workshop on the Fabrication, Characterization and Modeling of Ultra Shallow Junctions in Semiconductors, 5/06/2005Publication Junction architecture for planar devices
Proceedings paper2007, Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS 3: New Materials, Processes and Equipment, 6/05/2007, p.351-364Publication Laser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturability
Proceedings paper2008, Symposium on VLSI Technology. Digest of Technical Papers, 17/06/2008, p.186-187Publication Performance and leakage optimization in carbon and fluorine C0-implanted pMOSFETs
Proceedings paper2008, International Symposium on VLSI Technology, Systems and Applications - VLSI-TSA, 21/04/2008, p.30-31Publication Ultra shallow junctions formed by sub-melt laser annealing
Proceedings paper2005, 13th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP, 4/10/2005, p.87-91Publication Ultra-shallow junctions formed by C co-implantation with spkie plus sub-melt laser annealing
Journal article2008, Journal of Vacuum Science and Technology B, (26) 1, p.281-285