Browsing by Author "Flannery, C."

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Comparison of techniques to characterise the density, porosity and elastic modulus of porous low-K SiO2 xerogel films

Murray, C.
;
Flannery, C.
;
Streiter, I.
;
Schulz, S. E.
;
Baklanov, Mikhaïl
;
Mogilnikov, K. P.
Journal article
2002, Microelectronic Engineering, (60) 1_2, p.133-141
Comparison of techniques to characterize the density, porosity and elastic modules of porous low-k SiO2 xerogel films

Murray, C.
;
Flannery, C.
;
Streiter, I.
;
Schulz, S. E.
;
Baklanov, Mikhaïl
;
Mogilnikov, K. P.
Oral presentation
2001, MAM - European Workshop on Materials for Advanced Metallization; 5-7 March 2001; Sigtuna, Sweden.