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Browsing by Author "Fuchimoto, Daisuke"

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    Contour-based metrology for complex 2D shaped patterns printed by multiple-patterning process

    Fuchimoto, Daisuke
    ;
    Ishimoto, Toru
    ;
    Hiroyuki, Shindo
    ;
    Sugahara, Hitoshi
    ;
    Toyoda, Yasutaka
    Proceedings paper
    2014, Metrology, Inspection, and Process Control for Microlithography XXVIII, 23/02/2014, p.90500V
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    Implementation of templated DSA for via layer patterning at the 7 nm node

    Gronheid, Roel  
    ;
    Doise, Jan  
    ;
    Bekaert, Joost  
    ;
    Chan, BT  
    ;
    Karageorgos, Ioannis
    ;
    Ryckaert, Julien  
    Proceedings paper
    2015, Alternative Lithographic Technologies VII, 23/02/2015, p.942305
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    Measurement technology to quantify 2D pattern shape in sub-2xnm advanced lithography

    Fuchimoto, Daisuke
    ;
    Sakai, H.
    ;
    Shindo, H.
    ;
    Izawa, M.
    ;
    Sugahara, H.
    ;
    Van de Kerkhove, Jeroen  
    Proceedings paper
    2013, Metrology, Inspection, and Process Control for Microlithography XXVII, 25/02/2012, p.86810A

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