Browsing by Author "Fukugami, Norihito"
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Publication Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis
Oral presentation2015, Workshop NGL 2015 - The Japan Society of Applied PhysicsPublication Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis
Proceedings paper2015-07, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 20/04/2015, p.96580HPublication Impact of an etched EUV mask black border on imaging and overlay
;de Kruif, Rob ;Davydova, Natalia ;Connolly, Brid ;Fukugami, NorihitoLammers, AdOral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVL