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Browsing by Author "Fukugami, Norihito"

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    Publication

    Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis

    Watanabe, Genta
    ;
    Jonckheere, Rik  
    ;
    Verduijn, Erik  
    ;
    Fukugami, Norihito
    ;
    Sakata, Yo
    ;
    Kodera, Yutaka
    Oral presentation
    2015, Workshop NGL 2015 - The Japan Society of Applied Physics
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    Publication

    Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis

    Jonckheere, Rik  
    ;
    Verduijn, Erik  
    ;
    Watanabe, Genta
    ;
    Fukugami, Norihito
    ;
    Sakata, Yo
    ;
    Kodera, Yutaka
    Proceedings paper
    2015-07, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 20/04/2015, p.96580H
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    Impact of an etched EUV mask black border on imaging and overlay

    de Kruif, Rob
    ;
    Davydova, Natalia
    ;
    Connolly, Brid
    ;
    Fukugami, Norihito
    ;
    Lammers, Ad
    Oral presentation
    2012, International Symposium on Extreme Ultraviolet Lithography - EUVL

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