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Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis
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Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis
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Date
2015-07
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Jonckheere, Rik
;
Verduijn, Erik
;
Watanabe, Genta
;
Fukugami, Norihito
;
Sakata, Yo
;
Kodera, Yutaka
;
Gallagher, Emily
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1890
since deposited on 2021-10-22
Acq. date: 2025-12-12
Citations
Metrics
Views
1890
since deposited on 2021-10-22
Acq. date: 2025-12-12
Citations