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Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis

Date

2015-07
Proceedings Paper
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dc.contributor.authorJonckheere, Rik
dc.contributor.authorVerduijn, Erik
dc.contributor.authorWatanabe, Genta
dc.contributor.authorFukugami, Norihito
dc.contributor.authorSakata, Yo
dc.contributor.authorKodera, Yutaka
dc.contributor.authorGallagher, Emily
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVerduijn, Erik
dc.contributor.imecauthorGallagher, Emily
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.accessioned2021-10-22T19:57:50Z
dc.date.available2021-10-22T19:57:50Z
dc.date.issued2015-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25439
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2397266&resultClick=1
dc.source.beginpage96580H
dc.source.conferencePhotomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
dc.source.conferencedate20/04/2015
dc.source.conferencelocationYokohama Japan
dc.title

Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis

dc.typeProceedings paper
dspace.entity.typePublication
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