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Browsing by Author "Gangala, Hareen K"

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    0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling

    Tritchkov, Alexander
    ;
    Stirnimann, J.
    ;
    Gangala, Hareen K
    ;
    Ronse, Kurt  
    Journal article
    1998, Journal of Vacuum Science and Technology B, (12) 6, p.3398-3404
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    CD control using SiON BARL processing for sub 0.25µm lithography

    Zhang, Fenghong
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    Op de Beeck, Maaike  
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    Ronse, Kurt  
    ;
    Gangala, Hareen K
    ;
    Gopalan, P.
    ;
    Conley, P.
    Oral presentation
    1998, MNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium.
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    CD control using SiON BARL processing for sub-0.25μm lithography

    Zhang, Fenghong
    ;
    Op de Beeck, Maaike  
    ;
    Schaekers, Marc  
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    Ronse, Kurt  
    ;
    Conley, W.
    ;
    Gopalan, P.
    Journal article
    1999, Microelectronic Engineering, (46) 1_4, p.51-54
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    Lithography simulation with aerial image - variable threshold resist model

    Randall, John
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    Gangala, Hareen K
    ;
    Tritchkov, Alexander
    Journal article
    1999, Microelectronic Engineering, (46) 1_4, p.59-63
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    Lithography simulation with aerial image-variable threshold resist model

    Randall, John
    ;
    Gangala, Hareen K
    ;
    Tritchkov, Alexander
    Oral presentation
    1998, MNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium.
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    Qualification of electrical linewidth measurements (ELM) as a metrology tool for 0.18μm and below

    Marschner, Thomas
    ;
    Pollentier, Ivan  
    ;
    Baerts, Christina  
    ;
    Boltz, Ingo
    ;
    Ronse, Kurt  
    Proceedings paper
    1998, Proceedings of the Microlithography Symposium. Interface '98, 15/11/1998, p.263-276

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