Browsing by Author "Godny, Stephane"
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Publication Asymmetric relaxation of SiGe in patterned Si line structures
Proceedings paper2007, International Conference on Frontiers of Characterization and Metrology for Nanoelectronics at NIST, 27/03/2007Publication Gate-all-around MOSFETs based on vertically stacked horizontal Si nanowires in a replacement metal gate process on bulk Si substrates
Proceedings paper2016, IEEE Symposium on VLSI Technology, 13/06/2016, p.1-2Publication Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
Proceedings paper2016, Metrology, Inspection, and Process Control for Microlithography XXX, 21/02/2016, p.977807Publication Stack and topography verification as an enabler for computational metrology target design