Browsing by Author "Gornev, E."

Adsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian)

Adsorption isobars of fluorocarbon compounds selected for cryogenic etching of low-k materials

Investigation of plasma damage of low-k dielectrics during cryogenic etching

Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach

Maskless fabrication of high density silicon nan-pin structures with carbon nano clusters acting as mask for subsequent microwave silicon etching