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Browsing by Author "Graham, S."

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    Post metal etch polymer removal: an investigation of the cleaning to remove residual of Si-C and Si-F after fluorocarbon plama etch on the silicon surface

    Boullart, Werner  
    ;
    Mannaert, Geert  
    ;
    Graham, S.
    ;
    Tarassenko, C.
    ;
    Mouche, Laurent
    Oral presentation
    1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
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    Post metal etch polymer removal: an investigation of the cleaning to remove residual of Si-C and Si-F after fluorocarbon plama etch on the silicon surface

    Boullart, Werner  
    ;
    Mannaert, Geert  
    ;
    Graham, S.
    ;
    Tarassenko, C.
    ;
    Mouche, Laurent
    Proceedings paper
    1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.283-286

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