imec Institutional Repository Browsing {{ collection }} by Author "Granneman, E."

Publication

A new HF vapor process for native oxide removal, suited for cluster applications

Storm, Arjen

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Sprey, Hessel

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Maes, Jan

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Granneman, E.

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De Blank, Rene

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Röhr, Erika

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Caymax, Matty

Proceedings paper

1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.225-228

Publication

Electrical demonstration of thermally stable Ni silicides on Si1-xCx epitaxial layers

Machkaoutsan, Vladimir

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Verheyen, Peter

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Bauer, M.

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Zhang, Y.

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Koelling, Sebastian

Journal article

2010, Microelectronic Engineering, (87) 3, p.306-310

Publication

Intra-die temperature non uniformity related to front side emissivity depandence during rapid thermal annealing

Laviron, C.

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Lindsay, Richard

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Michallet, A.

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Halimaoui, A.

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Granneman, E.

Proceedings paper

2003, Advanced Short-Time Thermal Processing for Si-Based CMOS Devices, 28/04/2003, p.3-10

Publication

Thermal stability of Pt and C-doped NiSi films

Machkaoutsan, Vladimir

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Pagès, X.

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Bauer, M.

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Thomas, S.

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Mertens, Sofie

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Verheyden, K.

Proceedings paper

2007, 15th IEEE Conference on Advanced Thermal Processing of Semiconductors - RTP, 2/10/2007, p.145-149

Browsing by Author "Granneman, E."